The 19th International Symposium on Plasma Chemistry will be held in Bochum, Germany, during July 26 - 31, 2009. The scientific sessions will start in the morning of Monday, July  27, and close Friday, July 31, 2009 at Ruhr-University Bochum. Every day begins with plenary lectures in the morning followed by three topical sessions in parallel. The poster sessions are arranged in the late afternoon.
The final program can be found >here <.

6 plenary lectures (à 40+5 min) will provide a broad overview on hot topics in the field of plasma chemistry. Lectures will be given by:

	David Graves (Univ. Berkeley, USA)	New Frontiers from Old Ideas in Plasma-Surface Chemistry
	Joachim Heberlein (Univ. Minnesota USA)	Arc electrodes - where the plasma hits the solid wall
	Armelle Vardelle (Univ. Limoges, France)	Plasma liquid materials processing
	Jean-Michel Pouvesle (GREMI, France)	High voltage short pulse discharges: "old" tool, bright future?
	Kunihide Tachibana (Univ. Kyoto, Japan)	Microplasma generation in artificial media and its potential applications
	Klaus-Dieter Weltmann (INP Greifswald, Germany)	Atmospheric pressure plasma sources - prospective tools for plasma-medicine

22 topical invited lectures (à 25+5 min) will highlight the recent progress in the field. Lectures will be given by:

	Annemie Bogaerts (Univ. Antwerp, Belgium)		Modeling of the plasma chemistry and plasma-surface interactions in reactive plasmas
	Christine Charles (Australian Nat. University, Australia)		Plasma chemistry in space thrusters, e.g. the Helicon Double Layer Thruster
	Giorgio Dilecce (Univ. Bari, Italy)		Optical diagnostics of atmospheric pressure Dielectric Barrier Discharges
	Arutiun Ehiasarian (Univ. Sheffield, UK)		Dynamics and chemistry of high power impulse magnetron sputtering
	Renate Förch (MPI für Polymerforschung, Germany)		Biomaterial interactions at plasma polymer interfaces
	Onno Gabriel (TU Eindhoven, The Netherlands)		Gas phase kinetics and surface interaction in a hydrogen plasma jet
	Timo Gans (Univ. Belfast, UK)		Dynamics of radio-frequency driven microplasmas
	Sebastien Guimond (EMPA, Switzerland)		Plasma Functionalization of Textiles: Specifics and Possibilities
	Felipe Iza (Univ. Loughborough, UK)		RF atmospheric pressure microdischarges
	Michael Khor (Nangyang Univ., Singapore)		Thermal Plasma Processing of Novel NanoBioceramics and Composites: Nano-powders; Coatings and Cells
	Michio Kondo (AIST, Japan)		Plasma physics and chemistry for processing high quality thin film silicon at high deposition rates
	Maria Losourdo (Univ. Bari, Italy)		Plasmas facing Semiconductors and Oxides: Key issues to control and tailor their Interaction
	Vsevolod Maiorov (Univ. St. Petersburg, Russia)		Barrier discharge at atmospheric pressure: the role of photoemission in the discharge stability
	Maxime Mikikian (Univ. Orl&eacut;ns, France)		Dust particles in low-pressure plasmas: Formation and induced phenomena
	Erwine Pargon (Univ. Grenoble, France)		Discriminating the impact of UV, ions and radicals on the linewidth roughness of 193 nm resist patterns exposed to reactive plasmas
	Pierre Proulx (Univ. Sherbrooke, Canada)		Development and application of mathematical modelling to the thermal plasma processing of particulate materials.
	Koichi Sasaki (Univ. Nagoya, Japan)		Liquid phase laser ablation
	Luc Stafford (Univ. Montreal, Canada)		Experimental and modeling study of recombination reactions on dynamic surfaces in low-pressure plasmas
	Takayuki Watanabe (Tokyo Inst. Technol., Japan)		Innovative in-flight glass melting technology using thermal plasmas
	Christopher Whitehead (Univ. Manchester, UK)		Plasma-catalysis: a solution for environmental problems?
	Lenka Zajickova (Univ. Brno, Czech)		Synthesis and processing of carbon nanotubes by plasma technologies

Atomic Layer Deposition (ALD) is a well established technology to deposit thin films by using alternating chemical reactions and precursors. Thereby, a pure layer-by-layer growth is realized reaching excellent growth control and conformity as mandatory for future device generations in the semiconductor industry and the upcoming field of nanotechnology. Over the recent years ALD has been expanded towards plasma-assisted ALD to improve the flexibility in materials and to enable lower growth temperatures. This session is chaired by Anjana Devi (RUB) and Erwin Kessels (TU Eindhoven) and is devoted to introduce basic concepts of ALD and plasma-assisted ALD and to highlight the recent progresses in that field.

	E. Kessels, A. Devi (TU Eindhoven, Ruhr-University Bochum, )	Plasma-ALD - An Introduction
	E. Langereis (TU Eindhoven, The Netherlands)	Reaction mechanisms during plasma assisted atomic layer deposition
	J. Maes (ASM Leuven, Belgium)	Plasma enhanced atomic layer deposition of SiO2, Ta2O5 and TaCN
	C. Hodson (Oxford Instruments, Bristol, UK)	Emerging applications of plasma assited ALD

The combination of experiments and their theoretical description and prediction by plasma modelling is essential for the progress in plasma science. Over the recent years, several commercial and open source tools with a convenient user interface became available. This session is devoted to introduce these plasma simulation tools to experimentalist as being non-experts in modelling and to motivate them to benchmark and to validate their experimental data. This session is chaired by Ralf Peter Brinkmann/ Thomas Mussenbrock (RUB) and Boris Potapkin (Kurchatov Institute).

	T. Mussenbrock, B. Potapkin (Ruhr-University Bochum, Kurchatov Institute)	Plasma Modeling: Nuts and Bolts - an Introduction
	J. Verbonceour (Univ. Berkeley, USA)	Computer simulation: Particle-in-Cell Simulation of Collisional Plasmas
	M. Kushner (Univ. Michigan, USA)	Supporting Technology Development Through Modeling Fundamental Plasma Processes
	J. van Dijk (TU Eindhoven, The Netherlands)	Plasimo under the hood - The LinSys framework
	M. Deminsky (Kurchatov Institute, Russia)	Plasma-chemical mechanism understanding via partial modeling

The main program will be composed of approximately 110 oral contributions (à 15+5 min).

Three poster sessions will be arranged on Monday, Tuesday and Thursday afternoon.

The poster format is: A0 Portrait i.e. a width of 841 mm at a height of 1189 mm.

The registered participants at the biennial ISPC are automatically members of the International Plasma Chemistry Society (IPCS) for the two years following the participated Symposium. Membership fee is included in the registration fee of the ISPC. IPCS General Assembly is going to be held at 13:00 on Friday, July 31. All members are requested to attend the General Assembly for the purpose of approvals of the election of the Board of Directors, operating principles and future plans of the ISPC, etc.

Here, you can download the >final program<.