RoomA, 27, August
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27A-a0The role of modeling of non-equilibrium plasmas: Scientific curiosity or industrial tool?
 invited  Mark J. Kushner
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27A-a1Light emission characteristics of micro plasmas arrays operated under different operational conditions
Jochen Waskönig, Volker Schulz von der Gathen, Jörg Winter, Sun-Jin Park, J. G. Eden
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27A-a2Atmospheric-pressure discharge ignited on flexible electrodes of fabric structure
Osamu Sakai, Tatsuru Shirafuji, Kunihide Tachibana
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27A-a3Direct current parallel microdischarges in helium
Rémi Dussart, Thierry Dufour, Philippe Lefaucheux, Pierre Ranson, Larry Overzet, J.-B. Lee, Monali Mandra, Nader Sadeghi
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27A-a4Low-voltage APP-generation by piezo ceramics: A new (r)evolutionary enabling technology
 invited  Markus Teschke, Jürgen Engemann
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27A-a5Low-temperature non-thermal micro plasma jets for chemical reactions in liquids
Katsuhisa Kitano, Satoshi Hamaguchi
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27A-a6Study of the reactivity of a microplasma
Xavier Aubert, Andrei Pipa, Jurgen Ropcke, Antoine Rousseau
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27A-a7Discharge modes of microplasma with miniature gas flow
Kenichi Nanno, Takahiko Yamauchi, Shinji Ibuka, Koichi Yasuoka, Shozo Ishii
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27A-p1Control of plasma polymerization processes
 invited  Dirk Hegemann
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27A-p2The role of ions in thin film deposition in a pulsed acrylic acid RF discharge
Sergey Voronin, Mischa Zelzer, Catalin Fotea, Morgan Alexander, James Bradley
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27A-p3On the film microstructure control by means of plasma enhanced chemical vapor deposition and plasma assisted atomic layer deposition.
M. Creatore, N. M. Terlinden, E. Langereis, J. L. van Hemmen, W. M. M. Kessels, M. C. M. van de Sanden
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27A-p4Kinetics and transport of Cu and CuCl in Cu film deposition by metal chloride reduction plasma CVD
Naoki Oyama, Kei Furuta, Yugo Tomita, Naoki Yahata, Hitoshi Sakamoto, Koichi Sasaki
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27A-p5A new concept of adhesion promotion in metal-polymer composites by introduction of covalently bonded hydrophobic spacers at interface
Jörg Florian Friedrich, Renate Mix, S. Wettmarshausen, Heinz Sturm
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27A-p6Investigation of the Alignment Layers on Fluorinated Amorphous Carbon Films by Plasma Beam aligning
Tai-Hung Chen, Jyh-tong Teng, Chi-Hung Liu, Chin-Yang Lee, Huang Chin Tang, Chun-Hsien Su, Shermann Lin
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27A-p7Application of radio frequency Inductively Coupled Plasma (rf-ICP) in the measurement of physical properties of melts
Ala Moradian, Javad Mostaghimi