ISPC-12 / Minneapolis, USA / August 21-25, 1995 / Edited by J.V. Heberlein, D.W. Ernie, J.T. Roberts
Plenary Presentations
	A.1.01	Present and Future Modelling Approaches for Non-Equilibrium Plasmas at Low and High Pressures
	p3	M.J. Kushner
	A. 1.02	Advanced Diagnostic Techniques for Thermal Plasmas
	p4	J.R. Fincke, S.C. Snyder, W.D. Swank, D.C. Haggard
	E.1.01	New Frontiers in Thermal Plasma Processing
	p5	M. Boulos
	E. 1.02	Future Prospects for Dry Etching
	p6	K. Suzuki, N. Itabashi
	H.1.1	From Molecules to Particles in Silane Plasmas
	p7	A.A. Howling, Ch. Hollenstein, C. Courteille, L. Sansonnens, J.-L. Dorier
	J.1.01	Design of Novel Nanocrystalline Composite Materials by Means of Plasma CVD
	p8	S. Veprek
	J.1.02	Characterization of Low Pressure Plasmas Using Advanced Diagnostic Methods
	p9	K.H. Wiesemann
	M.1.01	High Temperature Treatment of Waste: From Laboratories to the Industrial Stage
	p10	R. Poiroux
Modification of Polymer Surfaces and Deposition of Polymer Films
	B. 1.01	Self-Consistent Analysis of Low-Temperature Oxygen Plasma and Processes of its Interaction with Some Polymer Materials
	p13	V. Rybkin, A. Bessarab, E. Kuvaldina, A. Maximov, V. Titov
	I.1.01	Plasmas and Polymers: From Laboratory to Large Scale Commercialization
	p14	M.R. Wertheimer, H.R. Thomas, M.J. Perri, J.E. Klemberg-Sapieha, L. Martinu
	B.1.02	Chemical Reactions on Plasma Functionalized Polymer Surfaces
	p15	J. Behnisch, A. Hollander, F. Mehdorn, H. Zimmermann, V.B. Ivanov
	B. 1.03	Nitrogen Plasma Treatment of Isotactic Polypropylene: Chemical Surface and Bulk Crystalline Structure Modifications
	p21	F. Poncin-Epailiard, T. Falher, J.C. Brosse, J.Y. Buzare, J. Emery, A. Gibaud, A. Desert
	B.1.04	Plasma-Treatment of Polymers by Means of NH3-H2 RF Glow Discharges
	p27	R. d'Agostino, M. Stendardo, P. Favia
	B.1.05	Introduction of Functional Groups on Polyethylene Surfaces in a Low Pressure Carbon-Dioxide Glow Discharge; a Mechanistic Study
	p33	G.A. Takens, J.G. Terlingen, G.H.M. Engbers, J. Feijen
	B.1.06	Spectrochemistry of Plasma-Induced Free Radicals in Glucose-Based Polycarbohydrates
	p39	M. Kuzuya, Y. Yamauchi, J. Niwa, S. Kondo
	B.1.07	Study of the Helium Plasma-Polypropylene Interactions. Effect on the Stability of the Wettability, Adhesion and Mechanical Properties of the Polymer
	p45	M. Tatoulian, F. Arefi-Khonsari, I. Rouger-Mabille, J. Amouroux
	B.1.08	Adhesion of Copper to Plasma-Treated Fluoropolymers
	p51	M.K. Shi, J.E. Klemberg-Sapieha, G. Czeremuszkin, L. Martinu, E. Sacher
	I.1.02	Plasma Polymerization of Acetylene in RF Box-Type Gas Discharge Reactor under Plug Flow Condition
	p57	K. Senda, T. Uchida, G.K. Vinogradov, S. Morita
	I.1.03	Fixed Site Facilitated Transport in Cobalt Chelate Containing Plasma Polymers
	p63	N.C. Morosoff, Y. Choe, N.E. Barr, V.T. Stannett, J.M. Skelly, A. L. Crumbliss
	I. 1.04	Mechanisms of Polymerization of Esters and Carboxylic Acids in a Radio Frequency-Induced Plasma
	p69	A.P. Ameen, A.J. Beck, F.R. Jones, L. O'Toole, R.D. Short
	I.1.05	In Situ FTIR Investigation of Methyl Methacrylate Plasma, Plasma Polymerized Film and Reaction Mechanisms
	p75	Y.V. Pan, D.D. Denton
	I.1.06	Plasma Synthesis of Polymeric Thin-Layer-Networks from High Molecular Weight Polysiloxanes
	p81	F. Denes, A.M. Sarmadi, R.A. Young, J.L. Shohet
	PB.1.29	Preparation of Thin Films of Poly-Thiophen by Atmospheric Pressure Glow (APG) Plasma
	p87	K. Tanaka, S. Okazaki, T. Inomata, M. Kogoma
	I.1.08	Energy Transfer from an Argon Plasma to Polystyrene Surface
	p93	R.M. France, R.D. Short
	PB.1.01	Hydrophobic Fluorocarbon and Organo-Silicon Condenser Tube Coatings Deposited by Plasma Enhanced CVD
	p99	M.P. Bonnar, B.M. Burnside, R.L. Reuben, J.I.B. Wilson, M. Liehr
	PB.1.02	Structural Analysis of Thin Film Prepared by Cold Remote Nitrogen Plasma Assisted Polymerization
	p105	F. Callebert, R. Stephan, O. Dessaux, P. Goudmand
	PB.1.03	Study of the Decomposition Mechanisms of (SF6-N2) Mixtures and Their Interactions with a High Density Polyethylene Target
	p111	A. Courtot, F. Arefi-Khonsari, J. Amouroux
	PB.1.04	Study of the Plasma-Polyethylene Interactions in the Case of SF6 and SF6 - CF4 Non-Equilibrium Discharges
	p117	Y. Khairallah-Abdelnour, F. Arefi-Khonsari, J. Amouroux, D. Leonard, P. Bertrand
	PB.1.05	Study of the Effect of an Ammonia or Oxygen Plasmas on the Physicochemical Modifications of PP Surface
	p123	N. Shahidzadeh-Ahmadi, F. Arefi-Khonsari, M.M. Chehimi, J. Amouroux
	PB.1.06	Improved Dyeing Properties of SiCl4-Plasma Treated Polyester Fabrics
	p129	A.M. Sarmadi, A.R. Denes, F. Denes
	PB.1.07	A Comparative Study of Plasma-State and PlasmaInduced Polymerization of Acrylonitrile for Modification of Cellophane Surfaces
	p135	L.D. Nielsen, F. Denes, R.A. Young
	PB.1.08	Surface Amination of Polypropylene Fabrics under Melamine-RF-Cold-Plasma Conditions
	p141	A.M. Sarmadi, X.F. Wang, F. Denes
	PB.1.09	Beryllium Containing Plasma Polymers; Their Preparation and Characterization
	p147	N.C. Morosoff, N.E. Barr, W.J. James, R.B. Stephens
	PB.1.10	Plasma Induced Grafting of Styrene and (2-Chloroethyl)Vinyl Ether onto Polyethylene I. Investigation of Surface Changes
	p149	A. Janke, K. Grundke, J. Bartella, H. Grunwald
	PB.1.11	Plasma Induced Grafting of Styrene and (2-Chloroethyl) Vinyl Ether onto Polyethylene II. Assessment of Biocompatability by Hepatocytes
	p155	R. Gebhardt, K.E. Geckeler, H. Grunwald
	PB.1.12	The Effect of Plasma-Initiated Graft Copolymerization on Surface of PTMSP Membrane to its Gas Permselectivity
	p161	X. Hou, J. Zhang, G. Li, Q. Sun
	PB.1.13	Design of Large Volume Remote Plasma Reactor. Relation Between the Functionalization and the Adhesion Quality of Polypropylene Surfaces Treated by a Remote Nitrogen Plasma
	p167	B. Mutel, C. Hoyez, O. Dessaux, P. Goudmand, L. Gengembre, J. Grimblot
	PB.1.14	Plasma Surface Modification of Polymers Characterized by Ellipsometry
	p173	R. Rochotzki, J. Meichsner
	2.1-39	Low Pressure Plasma Polymer Modification from the FTIR Point of View
	p179	M. Nitschke, M. Zeuner, J. Meichsner
	PB.1.16	In Situ XPS and Ex Situ XPS and TOF-SIMS Studies of Nylon 6 and PMMA Treated in Remote O2 and O2-N2 Plasmas
	p185	A. Scheuer, R. Prat, J.P Deville, D. Leonard, P. Bertrand
	PB.1.17	A Study of Gas Phase Processes in RF Plasma in the Mixture of Ar and Methylmethacrylate
	p191	A.N. Shcheglov, A.V. Kovalchiuk, T.I. Yuranova., V.N. Vasilets, A.N. Ponomarev
	PB.1.18	Preparation and Properties of Hydrophilic Plasma Polymer Films
	p197	H. Biederman, P. Hlidek, J. Jezek, D. Slavinska
	PB.1.19	Plasma and Vacuum Ultraviolet Initiated Polymerization of Mesogenic Monomers on the Surface of Fluorocarbon Polymers
	p203	V.N. Vasilets, T.I. Yuranova, A.V. Kovalchiuk, A.N. Ponomarev, R.V. Talroze, E.R. Zubarev
	PB.1.20	Optical Emission Spectroscopy of Tetrafluoromethane Plasma as a Diagnostic of Surface Modification of Polymer
	p209	W. Wang, F. Poncin-Epaillard, J.C. Brosse, D. Ausserre
	PD. 1.21	Functionalization of UHMW Poly(Ethylene) Membranes by a Carbon Dioxide Plasma Treatment
	p215	J.G.A. Terlingen, M. ter Beek, J. Feijen
	PB.1.22	On the Dynamics of the Top Layer of Polysulfone Membranes During Plasma Treatment
	p221	E. Aldea, G. Dinescu, G. Musa, G. Catana, B. Albu, G. Nechifor, G. Popescu, M. Olteanu
	PB.1.28	Surface Modification of Cellophane Films by Plasma Treatment for Membrane Applications
	p227	N.V. Bhat, A.H. Joshi, S.M. Pawde
	PB.1.23	Reactive Ion Etching of Poly(Tetrafluoroethylene) in CF4/O2 Plasmas for Improvement of Copper Adhesion
	p233	K.P. Lu, R.A. Clark, M. Hirsh, F.D. Egitto, L.J. Matienzo, G.A. Takacs
	PB.1.24	Silent Discharge Treatment of Biaxially Oriented Polypropylene
	p239	R.D. Boyd, O.D. Greenwood, J. Hopkins, J.P.S. Badyal
	PB.1.25	Laser-Induced Fluorescence of CF and CF2 Radicals: An In-Situ Diagnostic for Polymer Treatment in CF4 Discharges
	p245	A. Tserepi, T. Glasson, J.P. Booth, J. Derouard, N. Sadeghi
	PB.1.26	Reactions of Low Pressure Oxygen Plasmas with Liquid Aromatic Compounds
	p251	P. Patino, M. Ropero, D. Iacocca
	PB.1.27	Mechanisms of Gas Phase Convertion and Polymerization in Nonequilibrium Plasma
	p257	D.I. Slovetsky, A.l. Zimenok
Large Area Plasma Sources
	B.2.01	RF Inductive Discharge Source Design for Large Area Processing
	p265	A. Wendt, R.A. Breun
	B.2.02	Plasmachemical Activity of the Contact Region of Low Pressure Microwave Plasma Source Arrays
	p267	A. Ohl, W. Schleinitz, J. Ropcke, M. Kaning
	B.2.03	A 30-cm-class Plasma Source Using Microwave Slot Antennas on a Rectangular Waveguide for Large Area Plasma Processing
	p273	T. Yasui, H. Tahara, T. Yoshikawa
	B.2.04	Microwave Plasma Source Using Planar Ring-Cusp Magnetic Field and Reentrant Coaxial Cavity for Large Area Processing
	p279	T. Yasui, H. Tahara, T. Yoshikawa
	B.2.05	A Large Volume Radio Frequency Plasma Source with a Magnetic Line-Cusp Field
	p285	E. Yabe, T. Yajima, K. Takahashi, K. Nanri, T. Shiono, K. Kawamura, K. Takayama
	B.2.06	Application of a Large Area Inductive Ion Source to Diamond-Like Film Deposition
	p291	P. Bletzinger, A. Garscadden, R.L.C. Wu, W. Lanter
	B.2.07	Generation of a Large Area Thermal Plasma by Induction Heating with 50-kHz Frequency High Power Source
	p297	T. Sakuta, N. Sakashita, T. Takashima, M. Miyamoto, M. Yamada
	PB.2.01	Large Diameter Micro-Wave Plasma for Surface Treatment
	p303	S. Bechu, C.B. Laporte, P. Leprince, J. Marec
	PB.2.02	Modelling of Profile Effects for the LLNL Large Area Inductive Coupled Plasma Source
	p309	P. Vitello, G.J. Parker, N. Tishchenko, G. DiPeso
	PB.2.03	LLNL Large-Area Inductively Coupled Plasma (ICP) Source: Experiments
	p315	R.A. Richardson, P.O. Egan, R.D. Benjamin
	C.2.01	Measurements of CFx and SiHx Radicals in ECR and RF Plasmas Used for Material Processing
	p323	T. Goto
	C.2.02	Non-Local Behaviour of the Electron Component in Non-Equilibrium Plasmas
	p324	R. Winkler
	C.2.03	Emission and Absorption Spectroscopy Measurements of Atomic Hydrogen Level Populations in Expanding Magnetised Plasma
	p325	Z. Qing, D.K. Otorbaev, M.J.J. Eerden, G.J.H. Brussaard, M.C.M. van de Sanden, J.A.M. van der Mullen, D.C. Schram
	C.2.04	Spectroscopic Temperature Measurements in a H2 Microwave Discharge
	p331	L. Tomasini, A. Rousseau, G. Gousset, P. Leprince
	C.2.05	Fourier Transform Infrared Diagnostics of Reaction Products during Electron Cyclotron Resonance Plasma Etching of Si in Cl2
	p337	K. Ono, K. Nishikawa, M. Tuda, T. Oomori
	C.2.06	Atomic and Molecular Beams from Electrical Discharges: Their Characterization and Applications Useful for Plasma Diagnostic and Chemical Modelling
	p343	B. Brunetti, D. Cappelletti, S. Falcinelli, G. Liuti, F. Pirani
	C.2.08	Vacuum Ultraviolet to Visible Emission of Some Pure Gases Used for Plasma Processing
	p349	A. Kruse, A. Fozza, M.R. Wertheimer
	C.2.09	An Efficient Two-Zone Model of Capacitively Driven Low-Pressure Gas Discharges
	p355	R.P. Brinkmann, R. Fuerst
	C.2.10	Ion Kinetic Energy Distributions in a Compact ECR
	p361	H.M. Wu, D.B. Graves
	PC.2.01	Laser Produced Carbon Plasma in an Ambient Gas
	p367	S. Abdelli, T. Kerdja, D. Ghobrini, S. Malek
	PC.2.02	Measurements of N atom and N2(A) molecule densities in the flowing afterglow of a dinitrogen microwave plasma
	p373	J.A. Andari, A.M. Diamy, L. Hochard, J.-C. Legrand, A. Ricard
	PC.2.03	In Situ Monitoring of Plasma Etching and Deposition by Using the Gas Pressure Difference
	p379	J. Trnovec, V. Martisovits, I. Kosinar, M. Zahoran, R. Jurani
	PC.2.04	Fast Self-Consistent Kinetic Modelling of Low-Pressure RF Discharges
	p385	S.V. Berezhnoi, I.D. Kaganovich, U. Kortshagen, L.D. Tsendin
	PC.2.05	Fractional Dissociation Measurements of H2 and D2 in Molecular Gas Mixtures in RF Discharges
	p391	B.N. Ganguly, P. Bletzinger
	PC.2.06	The Effect of Excitation Frequency (f=10 kHz - 100 MHz) on the Formation of Excited Atoms and Radicals
	p397	H. Uyama, T. Harada, N. Tomikawa
	PC.2.07	NO (X,v) Distributions in rf Discharges: Conditions for a Very High Vibrational Pumping
	p403	S. De Benedictis, G. Dilecce, M. Cacciatore
	C.2.07	Diagnostics of Magnetically-Enhanced RF Discharge Plasmas in Methane: Absolute Density of Hydrogen Atoms
	p409	S.V. Avtaeva, M.Z. Mamytbekov, D.K. Otorbaev
	PC.2.08	Relaxing Kinetics of N2(B3PIg,v) in Pulsed RF Discharges: Experimental Results and Mechanisms
	p415	S. De Benedictis, G. Dilecce, M. Simek, M. Cacciatore
	PC.2.09	The Combined Thermal and RF-Plasma Activation of Chemical Reactions in the Model-System H2/I2/HI
	p421	A. Dernier, S. Gundermann, F. Miethke, A. Rutscher, H.-E. Wagner
	PC.2.10	Experimental Design Study by Optical Emission of a Magnetron Sputtering Discharge
	p427	M.F. Dony, A. Ricard, J.P. Dauchot, M. Wautelet, M. Hecq
	PC.2.1 1	Plasma Kinetic Model of DC Magnetron Reactive Sputtering in Ar-O2 Gas Mixtures
	p433	A. Ershov, L. Pekker
	PC.2.12	In Situ Measurement of the Electric Conductivity of Plasma Deposited Films Using Langmuir Probes
	p439	U. Flender, S. Rudakowski, K. Wiesemann
	PC.2.13	Surface and Volume Kinetics in a N2/O2 Low Pressure Glow Discharge
	p445	B. Gordiets, C.M. Ferreira, J. Nahorny, D. Pagnon, M. Touzeau, M. Vialle
	PC.2.14	Self-Consistent Kinetic Model for a N2-O2 DC Glow Discharge
	p451	V. Guerra, J. Loureiro
	PC.2.15	H Atom Density Measurements in H2 Microwave Discharge
	p457	L. Tomasini, A. Rousseau, G. Gousset, P. Leprince
	PC.2.16	The Application of Cooled Probes for the Investigation of the Change of Chlorinated and Unsubstituted Hydrocarbons in Plasma Jets
	p463	J. Lachmann, I. Borger, G. Schulz, G.B. Trusov
	PC.2.17	Similarity Principles of Non-Isothermal Plasma Chemical Reactors
	p469	H. Jacobs, F. Miethke, A. Rutscher, H.E. Wagner
	PC.2.18	Low Energy Electron Collisions in SiF4
	p475	R. Nagpal, A. Garscadden, D. Liptak, J. Clark
	PC.2.19	Modelling of the Reactivity of Vibrationally Excited Molecules in a Corona Plasma for Catalytic Reactions
	p481	M.A. Tas, R. van Hardeveld, E.M. van Veldhuizen, R.A. van Santen
	PC.2.20	Langmuir Probe Measurements of Plasma Parameters in a Planar Magnetron with Additional Plasma Confinement
	p487	P.Spatenka, I.Leipner, J.Vlcek, J.Musil
	PC.2.21	Electrons and Ions in a Radio-Frequency Oxygen Plasma
	p493	W.W. Stoffels, E. Stoffels, D. Vender, G.M.W. Kroesen, F.J. De Hoog
	PC.2.22	Ion Energy Distribution Functions in Microwave and Radio Frequency Plasmas
	p499	P. Reinke, O. Zabeida, B. Andreani, S. Bureau, L. Martinu
	PC.2.23	Loss Process of Negative Charges in He+SF6 After-Glow Plasma in Pulse Modulated RF Discharge
	p505	G. Tochitani, Y. Ohtsu, H. Nagata, H. Fujita
	PC.2.24	RF Plasma Monitoring Using Self Excited Electron Resonance Spectroscopy
	p511	M. Klick, W. Rehak
Etching
	F.1.01	Surface Chemistry During Plasma Etching of Silicon
	p519	V.M. Donnelly, I.P. Herman, C.-C. Cheng, K.V. Guinn
	F.1.02	Measurements of Mass Dependent Ion Flux, Radical Concentrations and Polymer Film Growth During the Etching of SiO2 and Si with High Density Fluorocarbon Plasmas
	p521	I. Abraham, R. Breun, N. Hershkowitz, K.H.R. Kirmse, J. Taylor, A. Wendt, R.C. Woods, J.Z., Wu, C. Yang
	F.1.03	Electron-Beam Injected Inductively Coupled Plasma Etching and Probe Measurements
	p527	R. Inanami, G.K. Vinogradov, S. Morita
	F. 1.04	Does it Matter What Type of Source is Used for Plasma Etching of Semiconductors?
	p533	N. Hershkowitz, R. Breun, J. Ding, K. Kirmse, C. Lai, J. Meyer, T. Quick, J. Taylor, R.C., Woods, J.Z. Wu, A. Wendt, C. Yang
	F.1.05	2-D Imaging of CF2 Density by Laser-Induced Fluorescence of CF4 Etching Plasmas in the GEC rf Reference Cell
	p539	B.K. McMillin, M.R. Zachariah
	F.1.06	The Chemistry of Halocarbon RF Plasmas Studied by Infrared Absorption Spectroscopy
	p545	E. Stoffels, W.W. Stoffels, M. Haverlag, G.M.W. Kroesen, F.J. de Hoog
	F.1.07	Dry Etching of Si/SiGe Multiple Stacks: Process Control by Optical Emission Spectroscopy and Surface Analysis of Etched Films
	p551	H.H. Richter, A. Wolff, B. Tillack, M. Szczypior, D. Kruger, C. Eggs
	F.1.08	Plasma Etching of High-Aspect-Ratio Interchip Vias for Vertical Integration of Chips
	p557	M. Engelhardt
	PF.1.01	Patterning of Metal Oxide Transparent Electrodes for Flat Panel Displays using an Ar/Cl2 Based Reactive Ion Etch Process
	p563	J. Molloy, P. Maguire, S. Laverty, J. McLaughlin
	PF.1.02	Bird's Head Planarization for Bipolar Devices
	p569	C. Jehoul, M. Roussel, J. Durand
Bulk Plasma Synthesis
	B.3.01	Investigation of Ozone Generation on Dielectric Surfaces
	p575	R. Richter, G. Pietsch
	B.3.02	Direct Conversion from Methane to Methanol by a Pulsed Silent Discharge Plasma
	p581	K. Okazaki, T. Nozaki, Y. Uemitsu, K. Hijikata
	B.3.03	Study of a Desulfurization Process under Plasma Conditions with ArIH2 Mixture
	p587	M. Mohammedi, J.L. Leuenberger, J. Amouroux
	B.3.04	Cracking of Hydrocarbons in a Plasma Reactor with High Concentration of Activated Hydrogen: Interactions H°/CH3° Radicals and Effects on Hydrocarbons Conversion
	p595	J.L. Leuenberger, M. Mohammedi, E. Francke, J. Amouroux
	PB.3.07	Kinetics of Chemical Reactions of Methane in the Flowing Afterglow of a Dinitrogen Microwave Plasma
	p601	J.C. Legrand, A.M. Diamy, R. Hrach, V. Hrachova
	B.3.06	Reactive Plasma Upgrade of Squalane - A Heavy Oil Simulant
	p607	P.C. Kong, A.D. Watkins, B.A. Detering, C.P. Thomas
	B.3.07	Production of Calcium Carbide in a Plasma-Jet Fluid Bed Reactor
	p613	M.H. El-Naas, R.J. Munz, F. Ajersch
	B.3.08	Combined Plasma-Sorption Process for Producing Monosilane from Fluoride Raw Material
	p619	I.N. Tumanov
	PB.3.0	Ozone Generation by Superimposing Silent Discharge and Ultraviolet Irradiation
	p625	Y. Ehara, M. Ishizaka, H. Kishida, T. Ito
	PB.3.02	Control of Silicon Particles Velocities in RF Thermal Plasma by L.D.A. for Purification Process
	p631	E. Francke, I. Cazard-Juvernat, M. Arnold, D. Morvan, J. Amouroux
	PB.3.03	The Use of Gas Mixtures in a DC Plasma Torch to Increase the Operating Voltage, while Maintaining Stability, and Application to an Inflight Reactor
	p637	J.E. Harry, Q. Yuan
	PB.3.04	Processing of Uranium Hexafluoride in a Rotary Plasma Reactor
	p643	A. Huczko, R. Li, M. Boulos
	PB.3.05	Temperature Measurement Based on C2 Swan Spectrum in a Transferred Arc in CH4 + CO2 Mixture
	p651	H. Nassar, K. Meguernes, A. Czernichowski, J. Chapelle
	PB.3.06	Plasma Quench Technology for Natural Gas Conversion Applications
	p657	B.A. Detering, P.C. Kong, C.P. Thomas
High Pressure Non-Equilibrium Plasmas for Environmental Applications
	C.1.01	Electron Beam and Pulsed Corona Processing of Volatile Organic Compounds in Gas Streams
	p663	B.M. Penetrante, M.C. Hsiao, J.N. Bardsley, B.T. Merritt, G.E. Vogtlin, P.H. Wallman, A. Kuthi, C.P. Burkhart, J.R. Bayless
	C. 1.02	Processing of Pollutants in Dielectric-Barrier in Plasma Reactors
	p665	L.A. Rosocha, J.J. Coogan
	C.1.03	NOx-Reduction in Synthetic Air by Dielectric Barrier Discharges
	p671	M. Klein, G. Lins, M Romheld, R.J. Seebock
	C.1.04	Modelling of the Removal of Nitric Monoxide from Exhausts by Dielectric Barrier Discharges
	p677	W. Niessen, M. Neiger, R. Schruft
	C.1.05	Plasma Assisted N2O Oxidation and Reduction
	p683	A. Fridman, B. Potapkin, M. Strelkova, A. Czernichowski, A. Charamel, A. Gorius
	C. 1.06	Purification Processes in Heterogeneous Non-Equilibrium Plasma
	p685	B.V. Potapkin, M.A. Deminski, A.A. Fridman
	C.1.07	The Conversion of NO by a Corona Discharge Through a Catalyst Bed
	p691	M.A. Tas, R. van Hardeveld, E.M. van Veldhuizen, R.A. van Santen
	C.1.08	Decomposition of Trichloroethylene by a Large Scale, High Flow Packed-Bed Gas Phase Corona Reactor
	p697	B. Lerner, J. Birmingham, R. Tonkyn, S. Barlow, T. Orlando
	C.1.09	Plasma Assisted Spectroscopic Monitoring of Alkali Metals in Pressurized Combustion and Gasification
	p705	V.T. Hayrinen, R.G. Hernberg
	C.1.10	The Use of Inductively Coupled Plasma Atomic Emission Spectrometry in Environmental Surveying and Geochemical Prospecting
	p711	M. Odegard
	PC.1.01	Chemical Kinetic Modelling of Ar-CO2 Thermal Plasmas Under Reduced Gas Pressure Conditions
	p717	T.G. Beuthe, J.S. Chang
	PC.1.02	Investigation on the Departures from Thermodynamic Equilibrium in a DC Plasma Jet
	p723	M. Cao, D.V. Gravelle
	PC.1.03	Electrically Assisted Water Shift Reaction
	p729	A. Czernichowski, K. Meguernes
	PC.1.04	Generation of Non-Thermal Transient Gas Discharges at Atmospheric Pressure for Pollution Control
	p735	R. Kutzner, J.G.H. Salge
	PC.1.05	Modelling the Plasma Chemistry of a Pulsed Corona Discharge in Dry and Humid Air
	p741	W.L. Morgan, M. Jacob, E.R. Fisher
	PC.1.06	Thermodynamic Aspects of Processes Taking Place in a Discharge Gap of an Ozonizer
	p747	J. Ozonek, S. Fijalkowski, I. Polio
	PC.1.07	Ionizational Nonequilibrium in Thermal Air Plasmas
	p753	C.O. Laux, R.J. Gessman, C.H. Kruger
	PC.1.08	The Distribution of Atomic Hydrogen in an Atmospheric-Pressure Free-Burning Arc Discharge
	p759	S.C. Snyder, A.B. Murphy, D.L. Hofeldt, L.D. Reynolds
	PC.1.09	Generation of Microwave Cold Plasma at Atmospheric Pressure
	p765	K. Sugiyama, K. Tsutsumi, A. Itoh, T. Matsuda
	PC.1.10	Thermal and Chemical Non-Equilibrium Flowfields in an Arcjet Expansion Nozzle for Low Pressure Plasma Processing
	p771	H. Tahara, K. Komiko, T. Yasui, T. Yoshikawa
	PC.1.11	Diagnostic Study of DC Gliding Arc Discharge
	p777	M. Simek, M. Clupek
	PC.1.12	Formation of a DC Glow Discharge at Atmospheric Pressure Using Solid Electrolyte
	p783	Y. Torimoto, S. Yao, A. Harano, M. Sadakata
	PC.1.13	Study of Ar/CF4/H2 Inductively Coupled Plasma: Effect of Hydrogenated and/or Oxygenated Atmosphere. Comparison to Ar/CH4 System
	p789	S. Al Ayoubi, M.F. Gonnord, S. Cavvadias, A. Ricard, J. Amouroux
	PC.1.14	Kinetical Modelling of Chemical Processes During Conversion of Chlorinated Hydrocarbons in a Thermal Plasma
	p795	I. Borger, J. Lachmann, B.G. Trusov
	PC.1.15	Gliding Arc Treatment of Aqueous Solutions Near Atmospheric Pressure
	p801	M. Chabchoub, J.L. Brisset, A. Czernichowski
	PC.1.16	Radical Oxidation Automotive De-NOx
	p807	B. Chang, M. Garcia
	PC.1.17	OH Generation in Steam-Air Pulsed Corona
	p813	M. Garcia, B. Chang
	PC.1.18	The Effect of Superimposed Discharge on the Decomposition of NOx in Exhaust Gas
	p819	T. Ito, T. Nomura, H. Miyamoto, Y. Ehara
	PC.1.19	Industrial Trials of the GlidArc Plasma Reactor
	p825	T. Janowski, H.D. Stryczewska, A. Ranaivosoloarimanana, A. Czernichowski
	PC.1.20	Spectroscopic Temperature Measurement in Dielectric Barrier Discharges
	p831	M. Klein, M. Romheld, R.J. Seebock
	PC.1.21	Oxidation of Aromatic Hydrocarbon in a Low-Pressure Plasma Catalytic Fluidized-Bed Reactor
	p837	M. Langleron, J.-L. Havet, S. Cavvadias, J. Amouroux
	PC.1.22	UV Emission and Chemical Kinetics of Positive Coronas as Envisaged for Flue Gas Treatment
	p843	M. Jacob, T.H. Teich
	PC.1.23	Experimental Equipment for Toxic Substances Destruction Using Plasma Processing
	p849	O. Coufal, J. Gregor, M. Hrabovsky, J. Senk, J. Teply
	PC.1.24	A Prevented Spark Reactor for Pollutant Control Investigation of NO, Removal
	p855	R. Hafez, S. Samson, E. Marode
Plasma Spraying
	C.3.01	Coating Generation: Vapor Cloud Surrounding a Particle Prior to Impact and Splat Formation
	p863	M. Vardelle, A. Vardelle, P. Fauchais
	C.3.02	Application of Plasma Spraying to Solid Oxide Fuel Cell Production
	p864	A. Notomi, N. Hisatome
	C.3.03	Suspension Plasma Spraying of Hydroxyapatite
	p865	E. Bouyer, F. Gitzhofer, M.I. Boulos
	C.3.04	Particle Temperature and Residence Time Control for Reactive Spraying
	p871	J.R. Fincke, W.D. Swank, D.C. Haggard
	C.3.05	Plasma Water Interactions in Underwater Plasma Spraying
	p877	B. Waldie, W.K. Harris
	C.3.06	Analysis of Thermally Induced Defects in DC Plasma Sprayed Thermal Barriers by the Use of an Acoustic Emission Technique
	p883	J. Voyer, F. Gitzhofer, M.I. Boulos, S. Durham
	C.3.07	Fume Generation Mechanism in Wire Arc Spraying
	p889	T. Watanabe, X. Wang, J. Heberlein, E. Pfender
	C.3.08	Plasma Spraying of Porous Ni/ZRO2-Cermet Anodes for the Solid Oxide Fuel Cells
	p895	E. Fendler, R. Henne, M. Lang
	C.3.09	Study of Deposition Offset in Plasma Spray of Zirconia
	p901	W.H. Zhuang, D. Gray, K. Etemadi, D.M. Benenson
	C.3.10	Enhancement of Coating Uniformity with Secondary Gas Atomization in Wire Arc Spray
	p907	X. Wang, J. Heberlein, E. Pfender, W. Gerberich
	PC.3.01	Thermal Cycling, Oxidation Behavior and Mechanical Properties of Graded and Duplex PSZ TBC Coatings
	p915	J. Musil, M. Alaya, R. Oberacker
	PC.3.02	Comparative Analysis and Testing of a Different Theories Characterizing a Diameter and Thickness of Plasma Sprayed Splats
	p921	O.P. Solonenko, A.V. Smirnov
	PC.3.03	Ceramic Coatings Using Quasi-Steady Magneto-Plasma-Dynamic Arcjet Generators
	p927	H. Tahara, K. Mitsuo, T. Yasui, Y. Kagaya, T. Yoshikawa
	PC.3.04	Augmentation of Thermal Barrier Coatings by Small Particle Plasma Spray
	p933	T. Bernecki
Special Session on Heat Transfer in Plasma Processing
	D.1.01	Control of Substrate Temperature During Diamond Deposition
	p937	M.T. Bieberich, S.L. Girshick
	D.1.02	Nozzle Optimization for Dissociated Species Transport in Low Pressure Plasma Chemical Vapor Deposition
	p938	C. George, G. Candler, R. Young, E. Pfender, J. Heberlein
	D.1.03	DC-Plasma Torches with Diverging Nozzles for Advanced Plasma Spraying
	p939	R.H. Henne
	D.1.04	Parameters Controlling the Generation and Properties of Plasma Sprayed Zirconia Coatings
	p940	P. Fauchais, M. Vardelle, A. Vardelle, M. Bianchi, A.G. Leger
	D. 1.05	On the Spreading and Solidification of Molten Particles in a Plasma Spray Process: Effect of Thermal Contact Resistance
	p941	M. Pasandideh-Fard, J. Mostaghimi
	D.1.06	Modelling of Nonequilibrium Effects in a High-Velocity Nitrogen-Hydrogen Plasma Jet
	p942	C.H. Chang, J.D. Ramshaw
	D.1.07	Development of a Sensing & Control Technique for an Innovative Atmospheric Plasma CVD Process
	p943	A.D. Watkins, S.C. Snyder, P.C. Kong
	D.1.08	Heat Transfer in Plasma Spraying
	p944	G. Nutsch, W. Rother
	D.1.09	Isotope Separation by DC Arc Discharge
	p945	M. Suzuki
	D.1.10	Fuzzy Logic Modelling for Process Optimization and Control
	p946	B. Schaible, Y.C. Lee
	F.2.01	Co-Processing Conception of a Quenching Plasma Reactor Associated to a Fluidized Bed Designed to Hydrogen Radical Production at Low Temperature
	p947	M.N. Mohammedi, S. Cavvadias, J.L. Leuenberger, E. Francke, J. Amouroux
	F.2.02	Diffusion Phenomena of a Cold Gas in a Thermal Plasma Stream
	p948	M. Rahmane, G. Soucy, M.I. Boulos
	F.2.03	The Role of Radical and Cluster in Thermal Plasma Flash Evaporation Process
	p949	Y. Takamura, K. Hayasaki, K. Terashima, T. Yoshida
	F.2.04	An Improved Method for the Calculation of Thermal Conductivities in the Low Temperature Region of Thermal Plasma Processes
	p951	H. Wilhelmi, H. Bollmann, T. Caesar, W. Aretz, S.W. Metz
	F.2.05	High-Definition Plasma Spraying with Wire Feedstock
	p957	J.R. Fincke, W.D. Swank, D.C. Haggard
	F.2.06	Studies on Plasma Heat Transfer
	p958	A. Kanzawa
	F.2.07	Plasma-Particle Momentum Transfer under Conditions of Great Knudsen Numbers and Thin Plasma Sheath
	p959	X. Chen
	F.2.08	Characterization of D.C. Plasma Torch Voltage Fluctuations
	p960	J.F. Coudert, M.P Planche, P. Fauchais
Environmental Applications of Plasma Chemistry
	G.1.01	Chemistry of the Electron Beam Process and its Application to Emission Control
	p963	H. Matzing, W. Baumann, H.-R. Paur
	G.1.02	Characterization of Chemical Processes in Non-thermal Plasmas for the Destruction of Volatile Organic Compounds
	p965	D.S. Green, L. Sieck, J.T. Herron
	G.1.03	Elimination of Organic Solvent in Air by Means of Plasma Technique
	p971	Y.J. Ge, S.G. Chen, Z.S. Qiao, D.B. Wang, G.Q. Zhang
	G.1.04	Spectroscopic Measurement of Radical in Non-Equilibrium Plasma
	p977	K. Habu, A. Harano, M. Sadakata, S. Hosokawa
	G.1.05	Stabilization of Trichlorotrifluoroethane(CFC-113) by Plasma Copolymerization with a Hydrocarbon Monomer
	p983	O. Tsuji, M. Sawai, H. Nakamo, T. Minaguchi, T. Wydeven
	G.1.06	The Corona Discharge in Humid Air as an Oxidizing Tool for the Destruction of Aromatic Solutes
	p989	V. Peulon, J.-L. Brisset
	G.1.07	Modelling of Capillary Tube Plasma Reactor Corona Discharge Parameters in Dry Air with Trace Volatile Organic Compounds
	p995	J.S. Chang, K. Urashima, H. Thompson, T.A. Myint, A. Chakrabardi, T. Ito
	G.1.08	Calcite Fluidized Bed Reactor Heated by Argon-Hydrogen Plasma Jets for the Destruction of Carbofluorine Wastes
	p1001	B. Pateyron, M.-F. Elchinger, G. Delluc, J. Erin, P. Fauchais
	G.1.09	3-D Computer Simulation of Electron Beam Cleaning Processes
	p1009	A.S. Petrusev, B.V. Potapkin, E.V. Shulakova, A.A. Fridman
	G.1.10	Plasma Treatment of Aluminum Dross
	p1015	A. Takeuchi, H. Hashimoto, K. Tanaka
	G.1.11	The First Step to Industrialize Decomposition Process of Ozone Depleting Substances by Steam Plasma
	p1021	S. Takeuchi, K. Takeda, N. Uematsu, H. Komaki, K. Mizuno, T. Yoshida
	N.1.01	Thermochemistry and Kinetics of Plasma Waste Destruction
	p1027	T. McAllister
	N.1.02	The Destruction of Toxic Liquid Wastes in an Induction Plasma Reactor
	p1033	E. Bergeron, G. Soucy, M. Boulos
	N.1.03	Investigation of the Pyrolysis of Chlorinated Hydrocarbons in an Argon Plasma Jet
	p1039	B. Glocker, E. Messerschmid, S. Kanne, R. Berger
	N.1.04	Thermal Plasma Reduction of UF6
	p1045	J.R. Fincke, W.D. Swank, D.C. Haggard, B.A. Detering, P.C. Kong
	N.1.05	Destruction of CH3Cl Using Plasma Fluidized CaO Bed
	p1051	H. Sekiguchi, N. Matsudera, A. Kanzawa
	N.1.06	Induction-Coupled Plasma Energy Recycle and Conversion (PERC) of Military Waste Streams
	p1057	R.W. Smith, R. Mutharasan, R. Knight, D. Luu, K. Malladi, J. Serino, J. Vavruska, J. Persoon, M. Garrison
	N.1.07	Aluminum Can Recovery by Thermal Plasma
	p1063	R.N. Szente, A.C. Cruz, L.B. Sousa
	N.1.08	Application of Plasma Arcs for the Pyrolysis of Mixed Solid/Liquid Waste Material
	p1069	B.D. Sartwell, J.L. Giuliani Jr., J.W. Fleming, J.P. Apruzese
	N.1.09	Carbon Monoxide Production from CO2 Using DC Plasma Jets
	p1071	M.D. Carabine, L.S. Vasanthakumar
	N.1.10	Incineration and Vitrification of Surrogate Nuclear Wastes by Thermal Plasma
	p1077	C. Girold, R. Cartier, J.P. Taupiac, C. Vandensteendam, J.M. Baronnet, T. Flament
	N.1.11	Pulsed Positive Corona in Water
	p1083	E.M. van Veldhuizen, W.R. Rutgers
	PG.1.02	Energy Consideration for Steam Plasma Gasification of Black Liquor and Chemical Recovery
	p1089	J.D. Grandy, P.C. Kong
	PG.1.03	Parameters Study of Plasma Jet Behavior with a Numerical Simulator
	p1095	K. Matsuyama, R. Yamamoto
	PG.1.04	Application of Hollow Anode Ion-Electron Sources in Plasma Chemistry
	p1101	V. I. Miljevic
	PG.1.05	Chemical Kinetics Model for NO Reduction from Flue Gas Excited by Pulsed Corona Discharge
	p1107	M. Yousfi, J. Hart, A. Hamani, A. Hennad, M. Benabdessadok, O. Eichwald
	PG.1.06	On the Use of the \"Electrical Wind\" to Improve the Removal Efficiency of Air Pollutants Treated by Corona Discharges
	p1113	J. Pinart, A. Goldman, M. Goldman, M.-E. Pinart, V.D. Tessier
	PG.1.07	Decomposition of 1, 2-Dichloroethane in Hydrogen by Non-Equilibrium RF Plasma
	p1119	G. Schulz, G. Birkhahn, I. Borger, J. Lachmann
	PG.1.08	Experimental Investigations of the Removal of Toxic Exhaust Gas Components by Dielectric Barrier Discharges
	p1125	O. Wolf, F. Weiser, M. Neiger
	PG.1.09	Ozone for NOx Elimination from Waste Gases
	p1131	J. Wolinska, I. Pollo
	PG.1.10	Physical-Chemical Mechanisms of NOx Oxidation Stimulated by Electron Beam
	p1137	E.V. Shulakova, M.A. Deminsky, A.A. Fridman, B.V. Potapkin
Synthesis of Particles and Clusters
	G.2.01	Analysis of Coulomb-Crystal Formation Process for Application to Tailored Particle Synthesis in RF Plasmas
	p1145	K. Tachibana, Y. Hayashi
	G.2.02	Induction Plasma Synthesis of Ultrafine SiC
	p1146	F. Gitzhofer
	G.2.03	Nanocrystalline Ceramic SiC, TiC and SiC-TiC Powders Produced in an RF Induction Plasma
	p1147	H.-D. Klotz, R. Mach, F. Oleszak, K. Szulzewsky, W. Kramer, E. Schierhorn
	G.2.04	Synthesis of Ultrafine Powders by MW Plasma at Atmosphere Pressure
	p1153	G.L. Zheng, S.C. Li, R.Y. Cheng
	G.2.05	Characterization of a 3-Phase AC Plasma Reactor for Carbon Black Synthesis from Natural Gas
	p1159	L. Fulcheri, G. Flamant, B. Variot, B. Ravary, J.M. Badie
	G.2.06	Carbonization of Hexane and Toluene in an RF Thermal Plasma at Normal Pressure
	p1165	J. Szepvolgyi, M.T. Beck, S. Keki, I. Mohai
	G.2.07	Carbon Clusters and Fullerene Formation in Turbulent Radial Jet from Graphite Contact Arc
	p1171	G.I. Sukhinin, O.A. Nerushev
	G.2.08	The Plasma Production of Fullerenes
	p1177	T. Alexakis, Y.S. Tsantrizos, J.L. Meunier, P.G. Tsantrizos
	G.2.09	Fullerene Formation in a Helium-Carbon Plasma
	p1183	A. Huczko, H. Lange, P. Byszewski
	G.2.10	Deposition of C60 in the Microwave Plasmas
	p1189	T. Ikegami, O. Matsumoto
	G.2.11	Thermal Plasma Modification of Titanium Carbide Powder - Numerical Analysis of Powder Behavior in Plasmas
	p1195	T. Watanabe, A. Kanzawa, T. Ishigaki, Y. Moriyoshi
	PG.2.01	Analysis of the Synthesis of Ultrafine AIN Powders in an Induction Plasma Reactor
	p1201	J.-F. Bilodeau, P. Proulx
	PG.2.02	Synthesis of Ultrafine Powders of Silica in a DC Transferred Plasma Arc Furnace
	p1207	K. Chang, H. Ageorges, S. Megy, C. Vandensteendam, Ph. Rouhmilhac, J.M. Baronnet
	PG.2.03	Preparation of Ultrafine Calcia Powder by Air Plasma
	p1213	Y. Fan, L. Fu, M. Zhang, J. Xiao, J. Young
	PG.2.04	Laserinduced Synthesis and Characterisation of Boron Doped Nanosized Silicon Carbide Powders
	p1219	J. Forster, P. Buchner, J. Uhlenbusch
	PG.2.05	High Frequency Capacitor Plasmatorches for Synthesis of New Ceramic Powders at High Pressure
	p1225	S. Dresvin, V. Goldfarb, J. Amouroux
	PG.2.06	Ultrafine SiC Synthesis Using Induction Plasmas: A Parametric Study
	p1231	J.Y. Guo, F. Gitzhofer, M.I. Boulos
	PG.2.07	RF Induction Plasma Synthesis of Si3N4-SiC Composite Powders from Different Silanes and Silane Mixtures
	p1237	R. Mach, H.-D. Klotz, H. Drost, I. Kosche, C. Olschewski, F. Zygalsky
	PG.2.08	Properties of Plasma Silica Powders used to Sapo Molecular Sieve Synthesis
	p1243	G. Schulz, H. Geissler, M. Braun
	PG.2.09	Synthesis of a New Y-Fe-O Ultrafine Particles Using Inductively Coupled Plasma
	p1249	M. Sugasawa, N. Kikukawa, N. Ishikawa
	PG.2.10	Synthesis of Silicon Nitride Nanopowders in an RF Thermal Plasma Torch: Comparative Study on Different Precursors
	p1255	J. Szepvolgyi, I. Mohai, G. Baksa
	PG.2.11	Rapid Nitriding of Aluminum under Nitrogen Glow Plasma
	p1261	S. Ito, K. Akashi, H. Takahashi, K. Yoshida
	PG.2.12	Plasma Arc Process for Producing Disperse Oxide Materials from Volatile Fluorides
	p1267	I.N. Tumanov, V.A. Hohlov, V.D. Sigailo, S.A. Kuzminykh, S.D. Shamrin
	PG.2.13	Arc Plasma Process for Producing High-Quality Ceramic Materials from Solutions and Melts
	p1273	I.N. Tumanov, V.A. Hohlov, V.D. Sigailo, V.B. Khodalev, S.D. Shamrin, A.V. Sigailo
	PG.2.14	Cathodic Arc Carbon Plasma-Gas Interaction Effects at Low Pressures of He, Ar and N2 in Fullerene Synthesis
	p1279	J.-L. Meunier
Plasma-Particle Interaction
	I.3.01	Formation of Dense Submicronic Clouds in Low Pressure Ar-SiH4 RF Reactor: Diagnostics and Growth Processes from Monomers to Large Size Particulates
	p1287	A. Bouchoule, L. Boufendi, J. Hermann, A. Plain, T. Hbid, G. Kroesen, E. Stoffels, W.W. Stoffels
	I.3.02	Kinetic Models of Plasma-Particle Charge, Momentum and Energy Transfer under Rarefield Flow Conditions
	p1288	A.G. Gnedovets
	I.3.03	On Morphology and Growth in Dust-Laden Plasmas
	p1289	P. Haaland, A. Garscadden, B. Ganguly
	I.3.04	Effects of Silicon Particles on DC and/or AC Discharge Characteristics in Magnetized Silane Plasmas
	p1295	H. Fujiyama, S.-C. Yang, Y. Nakajima, Y. Maemura, Y. Matsuda
	I.3.05	Thermal Plasma Expansion Process for the Controlled Synthesis of Silicon, Carbon, and Silicon Carbide Nanoparticles
	p1301	D. Hansen, B. Micheel, N. Rao, S. Girshick, J. Heberlein, P. McMurry
	I.3.06	Detection of Dust Particles by Laser Heating
	p1307	E. Stoffels, W.W. Stoffels, G.M.W. Kroesen, F.J. de Hoog
	I.3.07	Physical, Chemical and Microstructural Modification of Powders by Thermal Plasma Treatment
	p1313	T. Ishigaki, Y. Moriyoshi, J. Jurewicz, F. Gitzhofer, M.I. Boulos
	PI.3.01	Particle Contaminant Formation and Transport in Microelectronics Fabrication Processes
	p1319	B.W. Yu, A. Krishnan, M. Kelkar, N.P. Rao, S.L. Girshick
	PI.3.02	Transport Phenomena During the Vaporization of Metallic Waste Particle in a Plasma Jet
	p1325	A. Bamrim, G. Flamant, J.M. Badie
	PI.3.03	Nucleation Phenomena in D.C. High Pressure Electrical Discharges and Post-Production of Ultra-Fine Aerosol
	p1331	J.P. Borra, D. Boulaud, A. Goldman, M. Goldman
	PI.3.04	A Study of the Influence of Plasma Jet Confinement on Particle Parameters in Induction Plasma Processing
	p1337	S. Coulombe, M.I. Boulos
	PI.3.05	Injection and Trajectories of Particles in DC Plasma Spray Processes
	p1343	B. Dussoubs, A. Vardelle, K-I Li, M. Vardelle, P. Fauchais
	PI.3.06	Forces Acting on a Spherical Particle in a Rarefied Plasma
	p1349	A.G. Gnedovets, A.V. Gusarov, A.A. Uglov
	PI.3.07	Hydrodynamics and Stability of Plasma Spouted Beds
	p1355	H. Hamdi, J. Jurewicz
	PI.3.08	Thermal Plasma Modification of Titanium Carbide Powder - Thermochemical Analysis and Experimental Study
	p1361	T. Ishigaki, Y. Moriyoshi, T. Watanabe, A. Kanzawa
	PI.3.09	Electrostatic Field Effects on the Transport of Macroparticles in Magnetized Plasma Ducts
	p1367	M. Keidar, I. Beilis, RL. Boxman, S. Goldsmith
	PI.3.10	On the Electrical Charging of Dust Particles in a Capacitively Coupled RF Plasma
	p1373	U. Kortshagen, G. Mumken
	PI.3.11	A Model for Nanosize Silicon Particle Formation in a Thermal Plasma Expansion Reactor
	p1379	B. Micheel, D. Hansen, N. Rao, S. Girshick, J. Heberlein, P. McMurry
	PI.3.12	Adaptive Phase/Doppler Velocimeter and Its Applications to In-Situ Measurement of Fine Metallic Particles and Charged Particles
	p1385	A.A. Naqwi
	PI.3.13	Program Complex for Automation of a Computer Experiment in Plasma Dynamics of a Jet Disperse Systems
	p1391	O.P. Solonenko, A.P. Zinoviev
	PI.3.14	Numerical Analysis of Si Particles Injection Parameters Influence on Evaporation Process in Thermal Plasma Reactor
	p1397	P.Lj. Stefanovic, P.B.Pavlovic, Z.G. Kostic, D.B. Cvetinovic
Plasma-Surface Interaction
	G.3.01	Dissociation and Vibrational Deactivation of H2 and D2 on Metallic Surfaces: A Theoretical Survey
	p1405	M. Cacciatore
	G.3.02	Fluorination of Silicon in Fluorocarbon RF Discharges Studied by In Situ High-Speed Infrared Ellipsometry
	p1407	M. Haverlag, J.H.W.G. den Boer, G.H.P.M. Swinkels, G.M.W. Kroesen, F.J. de Hoog
	G.3.03	In Situ Fourier Transform Infrared Ellipsometry for Monitoring c-Si Etching Process by CF4 Plasma
	p1413	T. Shirafuji, K. Tachibana, S. Muraishi
	G.3.04	Comprehensive Study of Reaction Kinetics of Simplest Unsaturated Fluorocarbons in Non-Equilibrium Plasma. Mechanism of Heterogeneous Stages of Plasma-Surface Interactions
	p1419	G.K. Vinogradov, G.J. Imanbaev, A.G. Timokhov
	G.3.05	Energy Transfer and Oxygen Atoms Recombination on Refractory Materials. Aging Mechanisms of the Material
	p1425	F. Nguyen-Xuan, S. Cavvadias, J. Amouroux
	G.3.06	Oxygen Elimination and New Electronic Properties of Silicon Due to a Treatment by a Thermal Plasma (Argon + 1% of H2 or Argon + 10.6% of He)
	p1431	I. Cazard-Juvernat, B. Pajot, D. Morvan, J. Amouroux
	G.3.07	A Thermionic Cathode with Diffused Arc Root for Plasma Generators
	p1437	L. Lin, Z. Sun, B.Y. Wang, C.K. Wu
	G.3.08	Numerical Investigations of the Cathode Region of Electric Arcs
	p1443	A. Kaddani, O. Simonin, C. Delalondre
	G.3.09	A Simplified Unified Theory of Arcs and Their Electrodes
	p1449	J.J. Lowke, R. Morrow, J. Haidar
	G.3.10	Anodic Arc Root Behavior of a Transferred Arc Moving Orthogonally to a Plane Surface
	p1455	J.M. Sobrino, J.F. Coudert, P. Fauchais
	G.3.11	Local Current Density and Cathodic Arc Root Shape in a Rotating Thermal Arc
	p1461	P.T. Eubank, R.J. Munz
	PG.3.01	D.C. Plasma Jet Heating of a Rotating Cylinder: Modelling and Measuring
	p1469	D. Dublanche, J.F. Coudert, P. Fauchais
	PG.3.02	Evolution of the Plasma Flow Characteristics, During the First Hours, After Replacing the Set of Electrodes
	p1475	M.P. Planche, J.F. Coudert, P. Fauchais
	PG.3.03	Investigation of the Erosion Behaviour of Graphite and Silicon Carbide by Mass Spectrometry
	p1481	P. Dabala, M. Auweter-Kurtz
	PG.3.04	A Study of Excited Nitrogen Assist Chemical Reaction at PTFE Surface Treated by the Discharge in Smaller pd Region
	p1487	S. Hoshino, M. Yumoto, T. Sakai
	PG.3.05	Effects of Electrode Size on Electrode Erosion in AC Plasma Torches
	p1493	M. Iwata, S. Yasui, M. Shibuya
	PG.3.06	The Chemical Interaction between Plasma-Excited Nitrogen and the Surface of Oxide Catalysts
	p1499	S. Kameoka, M. Kuroda, T. Kuriyama, S. Ito, K. Kunimori
	PG.3.07	Vacuum Arc Movement on Various Graphite Cathode Ions Sources for Diamond-Like Arc Films Production
	p1505	M. Kandah, J.-L. Meunier
	PG.3.08	Improvement of Steel Surfaces by a Combination of Magnetron Sputtering and Plasma Nitriding
	p1511	J. Musil, J. Vlcek, V. Jezek, M. Benda, Z. Weiss
	PG.3.09	Mechanism of Surface Modification of Carbon Black in Plasma
	p1515	Y.J. Ge, S.G. Chen, D.B. Wang, G.Q. Zhang
	PG.3.10	Hydrogen Effects in Interaction Between Thermal Ar-H2 Plasma and Metal
	p1521	M. Suzuki, M. Hirayama, M. Nishikubo, H. Akatsuka
	PG.3.11	Properties of LaB6-W Electrode
	p1527	K. Tanaka, M. Ushio
	PG.3.12	Emission Spectroscopic Diagnostics and Result Comparison of Theoretical and Experimental Investigations in the Cathode Region
	p1533	X. Zhou, J. Heberlein
	PG.3.13	Theory of a Cathodic Part of High-Pressure Arc Discharges
	p1535	M.S. Benilov, A. Marotta
	PG.3.14	Plasma Cleaning of Steel and Aluminum Studied by Optical Emission Spectroscopy and Langmuir Probe Measurements
	p1541	C. Barholm-Hansen, H.C. Pedersen
	PG.3.15	Influence of RF-Cold Plasma Treatment on the Surface Properties of Security Paper
	p1547	Z.Q. Hua, E. Barrios, J. Evans, F. Denes, R.A. Young
	PG.3.16	Determination of N2 Atom Density in N2 and N2-CH4 H.F. Flowing Post-Discharges
	p1553	S. Bockel, A.M. Diamy, A. Ricard
	PG.3.17	Low Temperature Cleaning of InP Substrates Using H-Atoms. In-Situ Optical Methods for H2 Plasma and Surface Characterization
	p1559	G. Bruno, M. Losurdo, P. Capezzuto
	PG.3.18	Dense Medium Plasma Reactions: A New Approach to Plasma Chemistry
	p1565	F. Denes, R.A. Young
	PG.3.19	Effects of Corona Discharge Treatment on Enhancement of Seed Germination
	p1571	T. Watanabe, E. Kumano, A. Kanzawa
	PG.3.20	Energy Transfer to the Walls at Low Pressure Plasma Processing
	p1577	H. Kersten, H. Deutsch, H. Steffen
	PG.3.21	A Low-Pressure R.F. Oxygen Plasma as a Tool for Oxidation: The Treatment of Copper Foils
	p1583	N. Bellakhal, K. Draou, B. Cheron, M. Lenglet, J.-L. Brisset
	PG.3.22	Cold Plasma Treatment of Activated Carbon and Its Surface Properties
	p1589	N. Kurano, H. Yamada, K. Sugiyama
	PG.3.23	On the Thermophysical Model of Cold Electrodes Erosion
	p1595	L.I. Sharakhovsky, V.N. Borisjuk, A. Marotta, L.O. da Silva
	PG.3.24	Axial Scanning of Arc Roots in an Electric Arc Torch
	p1601	V.N. Borisyuk, A.M. Esipchuk, A. Marotta, A.S. Olenovich, L.I. Sharakhovsky, O.I. Yas'ko
Diagnostics and Modelling of High Pressure Plasmas
	I.2.01	Influence of Metallic Vapors on Electric Arc Properties
	p1609	S. Vacquie
	I2.02	Influence of Copper and Iron Vapours on an Argon Transferred Arc
	p1611	J.J. Gonzalez, M. Bouaziz, M. Razafinimanana, P. Gudzy, A. Gleizes, S. Vacquie
	I.2.03	Analytical Radiative Emission Results for Argon/Copper Thermal Plasmas
	p1617	J. Menart, E. Pfender, J. Heberlein
	I.2.04	Time Resolved Measurements of Arc Voltage, Temperature and Velocity in a d.c. Plasma Torch
	p1619	J.F. Coudert, M.P Planche, P. Fauchais
	I.2.05	Fluctuations of Light Intensity in Thermal Plasma Jet Generated by Water Stabilized DC Arc Torch
	p1627	M. Hrabovsky, M. Konrad, V. Kopecky, J. Hlina
	I.2.06	Electron-Temperature and Electron-Density Profiles in an Atmospheric-Pressure Argon Plasma Jet
	p1633	S.C. Snyder, L.D. Reynolds, J.R. Fincke, G.D. Lassahn, J.D. Grandy, T.E. Repetti
	I.2.07	Diagnostics and Modelling of a High-Power R.F. Plasma Flow
	p1639	M. Cao, M. Rahmane, D.V. Gravelle, G. Soucy, M.I. Boulos
	I.2.08	Interaction Between Subsonic Gas Flow and a Glydarc Electric Discharge
	p1645	J.E. Harry, Q. Yuan, M. Dubus
	I.2.09	Time-iterative Solutions of Inviscid Supersonic d.c. Plasma Jet
	p1651	B. Jodoin, P. Proulx, Y. Mercadier
	I.2.10	Mathematical Model for the Calculation of the Impedance of R.F. Inductively Coupled Plasmas
	p1657	A. Merkhouf, M.I. Boulos
	PI.2.01	Water Entrainment into Underwater Thermal Plasmas
	p1663	B. Waldie, E.J. Ryan
	PI.2.02	New Approach to Application of Classic Methods of Physical and Chemical Kinetics to Analysis of Efficiency of Plasma Technology of Coal Gasification
	p1669	E.I. Carpenko, B.N. Devaytov, M.P. Zhukov
	PI.2.03	Computational Study of Enthalpy Probe Measurements in High-Speed Plasma Flow
	p1675	C.H. Chang, J.D. Ramshaw
	PI.2.04	Experimental Study of Thermal Plasma Flow and Heat Transfer in a Tube
	p1681	X. Chen, L. Yu, B. Su
	PI.2.05	Mass and Energy Transfer Study of the Decomposition of NH3 in an Induction Plasma Reactor
	p1687	B. Davies, G. Soucy
	PI.2.06	Multicomponent Mass Transfer in a Plasma Reactor: Comparison of Three Different Diffusion Flux Formulations
	p1693	M. Desilets, P. Proulx
	PI.2.07	Dynamic and Static Behaviours of DC Vortex Torch Working With H2 and Ar-H2
	p1699	J. Erin, B. Pateyron, G. Delluc, P. Fauchais, M. Labrousse, A. Bouvier
	PI.2.08	Numerical Simulation of the Position and Rotary Velocity of Arc Spot in a Tubular Arc Plasma Generator with Double Steps
	p1707	Y. Fan, M. Zhang, L. Fu, J. Xiao, J. Yang, Y. Li
	PI.2.09	Splitted Arc Discharge of High Pressure
	p1713	V.I. Golysh, Yu.P. Simonov, V.N. Mukhazhanov
	PI.2.10	Interaction of Thermal Plasma Jet with the Stream of Injected Liquid
	p1719	M. Hrabovsky, M. Konrad, V. Kopecky, V. Sember
	PI.2.11	Voltage Gradient-Current Characteristics of Ar Torch Plasma Normalized by its Experimental Photo-Radius
	p1725	T. Inaba, M. Endo, Y. Watanabe, M. Shibuya
	PI.2.12	Net Emission Coefficient for Thermal Plasmas in H2, O2, C, H2O, CF4 and CH4
	p1731	H. Riad, J.J. Gonzalez, A. Gleizes
	PI.2.13	Mechanism and Kinetics of H2S-CO2 Mixture Dissociation in Plasma of a Microwave Discharge
	p1737	B.V. Potapkin, M.I. Strelkova, A.A. Fridman
	PI.2.14	RF Multiflux Plasmatron Study. Experimental Measurements and Modelling
	p1743	D. Morvan, J. Erin, S. Magnaval, J. Amouroux, S. Dresvin, S. Nguen-Kuok
	PI.2.15	High Enthalpy Plasma Sources for Re-Entry Simulation
	p1749	S. Laure, M. Auweter-Kurtz, H. Kurtz
	PI.2.16	2-D Simulation for a Spherical Top Inductively Coupled Plasma Source
	p1755	H.-M. Wu, M. Li, Y. Yang, C.-K. Wu
	PI.2.17	A Physical Modelling of a DC Plasma Torch
	p1761	J.M. Bauchire, J.J. Gonzalez, A. Gleizes
	PI.2.18	Plasma Plume Dynamics Metamorphoses during the Plume Laminar-Turbulent Transition
	p1767	L. Krejci, V. Dolinek, B. Ruzicka, L. Sara, V. Nenicka, J. Hlina
	PI.2.19	Numerical Simulation of a Non-Equilibrium Plasma Jet in an Applied Magnetic Field Using Three-Fluid Model
	p1773	H. Nishiyama, T. Saito, S. Kamiyama
	PI.2.20	Effect of a Magnetic Field on Turbulence of a Non-Equilibrium Plasma Jet
	p1779	T. Sato, H. Nishiyama, S. Kamiyama
	PI.2.21	Characterisation of Cascaded Arc Thermal Plasma Source in Argon and Hydrogen: Experiment and Modelling
	p1785	Z. Qing, D.K. Otorbaev, E.B. Kulumbaev, V.F.Semenov, V.M. Lelevkin, M.C.M. van de Sanden, D.C. Schram
	PI.2.22	Mass Spectroscopic and Optical Diagnostics of the Arc Discharge with Evaporated Graphite Cathode
	p1791	G.N. Kurtynina, D.K. Otorbaev
Characterization of Basic Process in Plasmas
	L.2.01	Modelling and Diagnostics of Plasma Chemical Processes in Mixed-Gas Arcs
	p1799	A.B. Murphy
	L.2.02	The Transport Phenomena in Non-Isothermal Multispecie Plasma
	p1801	I.D. Kaganovich, L.D. Tsendin
	L.2.03	The Argon-Hydrogen Expanding Thermal Arc Plasma
	p1807	R.F.G. Meulenbroeks, R.A.H. Engeln, M.C.M. van de Sanden, J.A.M. van der Mullen, D.C. Schram
	L.2.04	Theoretical Analysis of Removal of Oxides of Sulphur and Nitrogen in Pulsed Corona
	p1813	J.J. Lowke, R. Morrow
	L.2.05	Development of the Localization Method: Application for the Diagnostic of a Plasma Having a Plane of Symmetry
	p1819	S. Bousrih, S. Megy, E.A. Ershov-Pavlov, J.-M. Baronnet
	L.2.06	Optical Emission Measurements of an Inductively Coupled Argon Plasma(ICP)
	p1825	S. Jaffe, R. Hernberg
	L.2.07	Energy Balance in H2 - N2 Glow Discharges
	p1831	R. Nagpal, A. Garscadden
	L.2.08	Kinetic Analysis of Efficient H- Formation in Laser Irradiated H2
	p1837	A. Garscadden, R. Nagpal
	L.2.09	Property of RF Capacitive Discharge Containing Oxygen Negative Ions
	p1843	H. Amemiya, N. Yasuda, M. Endo
	PL.2.01	Mass Spectrometric Determination of Reaction Rates During Plasma Processing of Layers
	p1849	J. Trnovec, V. Martisovits, G.Cicala, P. Capezzuto, G. Bruno, R. Jurani
	PL.2.02	Particle Analysis at the Electrode Surfaces of an rf Discharge
	p1855	M. Zeuner, J. Meichsne
	PL.2.03	Non-Equilibrium Properties of Electric Arc Plasma and Combined Methods of Its Diagnostic
	p1861	I.L. Babich, A.I. Cheredarchuk, A.N. Veklich, V.A. Zhovtyansky, T. Shevchenko
	PL.2.04	Comprehensive Study of Reaction Kinetics of Simplest Unsaturated Fluorocarbons in Non-Equilibrium Plasma. Mechanisms of Gas Phase Transformations
	p1867	G.K. Vinogradov, A.G. Timokhov, A.I. Zimenok
	PL.2.05	Magnesium as a Representative Analyte Metal in an Argon Inductively Coupled Plasma
	p1873	J. Vlcek, L. Forejt
	PL.2.06	Pressure Dependence of Discharge By-Products from Ar-CH4-H2 and Ar-CO2-H2 Mixture ICP Plasmas
	p1879	J.S. Chang, H. Hayashi, C. Daza, D.C. Lee, C. Decey, K. Nagai
	PL.2.07	Study of the Plasma Chemistry of Sealed-Off CO2 Lasers with Novel Mass-Spectrometric Technique. Part I. Experimental Technique
	p1885	Y. Wang
	PL.2.08	On Generalization of Current-Voltage and Thermal Characteristics of Electric Arc
	p1891	A.F. Bublievski, A.M. Esipchuk, A. Marotta, O.I. Yas'ko
	PL.2.09	On the Adequacy of Approximation Methods for the Current-Voltage Characteristics of Arc Plasma Torches
	p1897	O.I. Yas'ko, A. Marotta, T.V. Laktyushina, L.O.M. da Silva
	PL.2.10	Effect of Gas Flow Rate and Electrodes Diameter Variation in the Similarity of Plasma Torches Characteristics for Different Methods of Experimental Data Approximation
	p1903	O.I. Yas'ko, A. Marotta, T.V. Laktyushina, L.O.M. da Silva
	PL.2.11	Current-Voltage Characteristics Generalization for Plasma Torches Operating with Different Gases
	p1909	O.I. Yas'ko, A. Marotta, T.V. Laktyushina, L.O.M. da Silva
Plasma Assisted CVD
	K.1.01	Plasma Deposition of Amorphous Silicon Alloys from Fluorinated Gases
	p1917	G. Cicala
	L.1.01	Synthesis of Carbon Clusters and Inorganic Thin Films by Low Temperature Plasma CVD under Atmospheric Pressure
	p1918	H. Koinuma
	N.2.01	Diamond Crystallization from Gas Phase and Carbon Allotropy
	p1919	V.P. Varnin
	N.2.02	Fast Deposition of Amorphous Layers
	p1920	M.C.M. van de Sanden, D.C. Schram
	K.1.02	Plasma Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous Silicon from Silane and Dichlorosilane Mixtures
	p1921	N. Hata, I.S. Osborne, A. Matsuda
	K.1.03	Mass Spectrometry and Power Measurements for Kinetics and Mechanism Investigation of Silane Glow Discharges
	p1927	N. Spiliopoulos, S. Stamou, D. Mataras, D. Rapakoulias
	K.1.04	Thin Layer Deposition Under High Energy Metal Ions Bombardment
	p1933	G. Musa, H. Ehrich
	PK.1.20	TEOS/O2 MMP-DECR Plasma Deposition. Growth Processes and Analytical Modelling
	p1939	R. Delsol, Y. Segui, P. Raynaud, B. Despax
	K.1.06	Deposition of Silica Thin Film on the Surface of Powder by PCVD Under Atmospheric Pressure
	p1945	T. Mori, S. Okazaki, T. Inomata, M. Kogoma
	K.1.07	Reactor Modelling for RF Plasma Deposition of SixNy-H Comparison Between Two Flow Arrangements
	p1951	H. Caquineau, G. Dupont, B. Despax
	K.1.08	Interface Formation Controlled by an Electro-Magnetron
	p1957	F. Olcaytug, H. Schalko, M.F. Ebel, H. Ebel, K. Piplits, H.K. Yasuda
	L.1.02	Hard Material Layers on the Basis of the System Ti-Al-C-O-N Deposited by Pulsed DC-Plasma
	p1963	K. Bartsch, W. Zulch, A. Leonhardt
	L.1.03	Characterization of Oxygen/TEOS Plasmas in a Helicon Diffusion Reactor using Mass Spectrometry and Optical Emission Spectroscopy
	p1969	A. Granier, A.J. Perry, F. Nicolazo, C. Vallee, A. Goullet, G. Turban, B. Grolleau
	L.1.04	Plasma Deposition Chemistry of Fluorinated Silicon Oxide Films
	p1975	S. V. Nguyen, M.J. Shapiro, T. Matsuda, D. Dobuzinsky, C.T. Dziobkowski
	L.1.05	Deposition of Transparent Conductive Tin Oxide Films by PACVD from a Mixture of TMT (Tetra methyl Tin) + O2 + Ar
	p1981	F. Arefi-Khonsari, Y. Farber, E. Benghozi, I. Mabille-Rouger, J. Amouroux
	L.1.06	Plasma-Assisted Evaporation of Titanium Dioxide Films
	p1987	Z. Alam, M. Kano, H. Uyama
	L.1.07	The Preparation of YBa2Cu3O7-X-Films by Plasma Flash Evaporation
	p1993	B. Michelt, G. Lins, R.J. Seebock
	L.1.08	LaMnO3 Perovskite Thin Film Deposition, from Aqueous Nitrate Solutions of La and Mn, in a Low Pressure Plasma Expanded Through a Nozzle
	p1999	S.F. Miralai, D. Morvan, J. Amouroux, A. Naoumidis, H. Nickel, R. Avni
	L.1.09	XPS Analyses of Zinc Containing Films Deposited by a Cold Remote Nitrogen Plasma
	p2005	B. Mutel, A. Ben Taleb, O. Dessaux, P. Goudmand, L. Gengembre, J. Grimblot
	N.2.03	Secondary Discharge Induced Nonequilibrium Chemistry in a CVD Diamond DC Arcjet Reactor
	p2011	S.K. Baldwin Jr., T.G. Owano, C.H. Kruger
	N.2.04	Diagnostics of Boundary Layer Chemistry in Thermal Plasma CVD
	p2017	T.G. Owano, E.H. Wahl, C.H. Kruger
	N.2.05	Experimental Study of Diamond Film Morphology and Surface Chemistry in RF Induction Plasma CVD
	p2023	J.W. Lindsay, H. Han, S.L. Girshick
	N.2.06	Deposition Area, Growth Rate, and Arc Power Scaling Laws for Diamond Film Deposited by Arc-Heated Gas Flows
	p2029	R.M. Young
	N.2.07	Chemistry in a Supersonic Vacuum Plasmajet
	p2035	H. Pauser, J. Laimer, H. Stori
	N.2.08	Preparation of Cubic Boron Nitride Films by RF Bias Sputtering
	p2041	O. Tsuda, Y. Yamada, Y. Tatebayashi, T. Yoshida
	N.2.09	Initial Stage of Cubic Boron Nitride Growth by Low Pressure ICP-CVD
	p2047	T. Ichiki, S. Amagi, T. Yoshida
	N.2.10	Deposition of Composite Metal/C:H Films and Their Basic Properties
	p2053	H. Biederman, P. Hlidek, J. Pesicka, D. Slavinska, V. Stundzia, J. Prokes, J. Zemek
	PK.1.01	Synthesis of Tantalum-Oxide Thin Film with Reactive DC-Magnetron Sputtering in Electron-Cyclotron-Resonance (ECR) Excited Ar + O2 Plasma
	p2059	T. Akitsu, H. Miyashita, Y. Nakagawa, H. Matsuzawa, T. Omata, T. Sukegawa, S. Nakamae, H. Sueki
	PK.1.02	Determination of Energy Distribution Functions of Fluxes in a D.C. Magnetron Discharge
	p2065	E. Blachere, C. Lefumeux, D. Degout
	PK.1.03	Space Resolved Optical Emission Spectroscopy of Ni(CO)4 Interaction with a Cold Remote Nitrogen Plasma
	p2071	A. Brocherieux, P. Supiot, O. Dessaux, P. Goudmand
	PK.1.04	Deposition of BaTiO3 Thin Films by Plasma MOCVD Method
	p2077	T. Chiba, O. Matsumoto
	PK.1.05	Optical Emission Study of the Laser Plasma Plume Produced During Y-B-C-O Superconducting and Pb-Zr-Ti-O Ferroelectric Film Preparation
	p2083	K. Ebihara, H. Kurogi, Y. Yamagata, T. Ikegami, B.Y. Tong
	PK.1.06	Plasma Diagnostics and Film Characterization of TiN Films Deposited in a Hollow Cathode Arc Discharge
	p2089	C. Eggs, H. Kersten, H.-E. Wagner, H. Wulff
	PK.1.07	Deposition of Polysiloxane Films Using CO2 Laser Evaporation Assisted by Remote O2 Plasma and Its Transformation to Silicon Oxide Films
	p2095	S. Hattori, T. Fujii, T. Yokoi, M. Hiramatsu, M. Nawata, M. Hori, T. Goto
	PK 1.08	Selective Control of Particles by Electron-Beam-Excited Plasma and Its Application
	p2101	S. Ikezawa, R. Miyano, R. Kitada, S. Izumi
	PK.1.09	Properties of TiN, Ti(C,N), TiC Films Prepared by Arc Ion Plating
	p2107	T. Takeda, T. Sato, S. Ito, H. Yumoto, K. Akashi
	PK.1.10	Effect of Nitrogen on Cathode Spot Characteristics in Arc Ion-Plating of TiN
	p2113	G. Kim, J.-L. Meunier, F. Ajersch
	PK.1.11	Process Diagnostics during the Deposition of Cubic Boron Nitride
	p2119	R. Pintaske, M. Schaller, N. Kahl, J. Hahn, F. Richter
	PK.1.12	Roles of H Radicals in the Low Temperature Growth of Poly-Si Films by Plasma CVD Using SiF4/SiH4/H2
	p2125	T. Shirafuji, K. Tachibana, T. Morita
	[PK.1.13	Hydrodynamic Investigation of a Low-Pressure Plasma Expanded Through a Nozzle (PETN) for Ceramic Oxides Depositions from Nitrate Precursors
	p2131	S.F. Miralai, E. Francke, D. Morvan, J. Amouroux, R. Avni
	PK.1.14	In Situ Characterization of Plasma-MOCVD of Ti-C-N Thin Films
	p2137	S. Peter, F. Richter
	PK.1.15	Improved Method for the Measurement and Control of the Actual Power Dissipated in RF Glow Discharges
	p2143	N. Spiliopoulos, D. Mataras, D. Rapakoulias
	PK.1.16	Supersonic Gas Jets Activated by an Electron Beam
	p2149	G.I. Sukhinin
	PK.1.17	Active Control of Nucleation Process in Plasma CVD by Ultra-Short High-Voltage Pulses
	p2155	K. Okazaki, S. Yasuda
	PK.1.18]	Surface Morphology Measurements and Particle Formation of SiOx Films Deposited Using Low Frequency Plasma CVD Method
	p2161	T. Yamaguchi, M. Shimozuma, H. Date, N. Sakamoto, H. Matsuura, H. Tagashira
	PN.2.01	Deposition of Diamond-Like Films in Hydrocarbon Plasma of Vacuum Arc and Unbalanced DC Magnetron
	p2167	V.P. Anisimov, I.A. Anisimova, D.K. Otorbaev
	PN.2.02	Dynamics of KrF Excimer Laser Plasma Plume Produced During Diamondlike Carbon Thin Film Preparation
	p2173	S. Aoqui, T. Ikegami, Y. Yamagata, K Ebihara
	PN.2.03	Microwave Surfatron System for Diamond Film Depositions
	p2179	L. Bardos, H.Barankova, S. Berg
	PN.2.04	Plasma Diagnostics and Modelling in Plasma Enhanced BN-Layer Deposition
	p2185	A. Lunk, A. Neuffer, K.-L. Barth
	PN.2.05	A Surface-Wave Driven Plasma Reactor for Thin Diamond Film Deposition: Parametric Study of the Process Parameter Influence on Film Roughness
	p2191	C.F.M. Borges, M. Moisan, D. Guay
	PN.2.06	Formation of Carbon Nitrides CNx Films Assisted by a TEA CO2 Laser Ablation Graphite in a Remote Nitrogen Plasma
	p2197	C. Jama, O. Dessaux, N. Duez, C. Dupret, P. Goudmand, L. Gengembre, J. Grimblot
	PN.2.07	Hard Amorphous Hydrogenated Carbon Films Deposited with an Expanding Thermal Plasma
	p2203	J.W.A.M. Gielen, P.R.M. Kleuskens, M.J. van der Zande, A.G.M Kiers, M.C.M. van de Sanden, D.C. Schram
	PN.2.08	Mass Spectrometric Analysis of a Thermal Plasma Used for CVD of Diamond Films
	p2209	P.G. Greuel, J.T. Roberts, D.W. Ernie
	PN.2.09	Diamond Deposition at Low Sustrate Temperatures in a Thermal Plasma Reactor
	p2215	Q.Y. Han, M. Asmann, J.V.R. Heberlein, E. Pfender
	PN.2.10	ID Diffusion Model for Moderate Pressure H2 Plasmas Used for Diamond Films Deposition
	p2221	K. Hassouni, S. Farhat, C.D. Scott, A. Gicquel
	PN.2.11	Diamond Deposition from Ar-CO2-CH4 Plasmas
	p2227	K. Itoh, O. Matsumoto
	PN.2.12	Preparation of Boron Nitride Thin Films by Sputtering Using R.F. Inductively Coupled Plasma
	p2233	Y. Kasori, S. Ito, K. Akashi
	PN.2.13	Langmuir Probe and Energy-Mass Spectroscopy Measurements in ECWR Plasmas for Diamond Deposition
	p2239	W. Kasper, P. Awakowicz
	PN.2.14	Two-Dimensional Diamond Chemical Vapor Deposition Simulation
	p2245	D. Kolman, J. Heberlein, E. Pfender, R. Young
	PN.2.15	Modelling of RF Plasma Discharges of Polyatomic Gases for Carbon Film Deposition
	p2247	K. Nagayama, B. Farouk, Y.H. Lee
	PN.2.16	Diamond Deposition on the Substrate Pretreated in N2-C2 H2 Plasma
	p2255	S. Narumi, T. Sato, S. Ito, K. Akashi
	PN.2.17	Preparation of Diamond Films in a Low Pressure Inductively Coupled RF Plasma
	p2261	K. Okada, S. Komatsu, T. Ishigaki, S. Matsumoto
	PN.2.18	Diamond Synthesis by RF Thermal Plasma CVD
	p2267	D.W. Park, H. Park
	PN.2.19	Deposition of a-C:HIDiamond Thin Film on the Heated Fe/Si Substrate in CH4 rf Discharge
	p2273	K. Saitoh, N. Mutsukura
	PN.2.20	Diamond Film Deposition in an Inductively Coupled Plasma Reactor
	p2279	P.R. Taylor, W. Liang
	PN.2.21	Microwave CH4/H2 Plasma Composition Analysis for Diamondlike Carbon Film Synthesis
	p2285	T. Yasui, H. Tahara, T. Yoshikawa
	PN.2.22	Deposition of Hard Carbon Film in CH4 RF Discharges Mixed with Ar and Xe
	p2291	K. Yoshida, N. Mutsukura
	PN.2.23	Diamond Film Synthesized by MW Plasma CVD and Computation Modelling of its Optical Parameters
	p2297	C.Q. Zheng, J.G. Ran, Z.G. Yu, S.W. Jiang, L. Gou
	PN.2.24	Process Characterization of CVD Diamond from Liquid Precursors
	p2303	Q.D. Zhuang, P. Schwendinger, C. Hammerstand, J. Heberlein, E. Pfender, R. Young
	PN.2.25	Mass Spectrometric Diagnostics and Modelling of Selected Species in CH4/H2 and C2H2/H2 Plasmas
	p2309	C.G. Schwarzler, O. Schnabl, J. Laimer, H. Stori
	PN.2.26	A New RF+DC Plasma CVD Method for Diamond Deposition
	p2315	S. Matsumoto, K.K. Chattopadhyay
	PN.2.27	Characteristics of c-BN/Diamond Bi-Layered Coatings
	p2321	C. Tsai, K. Ikeda, F. Kamikubo
Plasma Metallurgy
	K.2.01	Plasma Processing of Dusts and Residues
	p2325	D. Neuschutz
	K.2.02	Numerical Modelling of Metallic Bath Heating with Transferred Arc
	p2327	L. Trenty, A. Bouvier, C. Delalondre, O. Simonin, J.B. Guillot
	K.2.03	Effect of N2 and CO2 Additions on Arc Voltage and Steel Composition During Argon Plasma Heating of Steel Melts
	p2333	D. Neuschutz, A. Stuber
	K.2.04	Numerical Modelling of AC Electric Arcs
	p2339	H.L. Larsen, A. Hildal, V.G. Sevastyanenko, J.A. Bakken
	K.2.05	Plasma Transferred Arc Reactor (P<40kW) to Study the Carbothermic Reduction of Oxidized FeSi Fine Particles
	p2345	F. Petit, A. Grimaud, P. Fauchais
	K.2.06	Induction Plasma Synthesis of Al-Ni-Mo Intermetallic Powders as Precursors Alloys for Alkaline Water Electrolysis Cathodes
	p2351	F. Berube, J. Jurewicz, F. Gitzhofer
	K.2.07	Numerical Simulation of Si-O-C Arcs and Its Radiative and Transport Properties
	p2357	V.G. Sevastyanenko, L. Gu, J.A. Bakken